This paper describes the design, fabrication, and testing of electrostatically actuated microshutters used as active shadow masks to pattern evaporated materials. The fabricated microshutters can obstruct a 25-μm-wide aperture at an actuation voltage of 90 V, with a resonant frequency of 4 kHz due to a 400-μm-long actuator. The microshutters integrated with an x-y-z manipulator were used to print patterns of organic material and metal on glass substrates in vacuum with a pixel size of 25 μm . The maximum resolution achievable with this setup is 800 dpi , and we printed active organic light-emitting device arrays of 400 dpi resolution. This printing scheme could enable the patterning of large-area organic optoelectronic devices on diverse substrates.

10.1109/JMEMS.2006.889660